Objective To evaluate the indications, effectiveness and complications of vitreoretinal surgery using the 25G transconjunctival sutureless vitrectomy system (TSV25G) under the topical anesthesia. Methods The clinical and follow-up data of 22 eyes of 22 patients undergone vitreo-retinal surgery using TSV25G under the topical anesthesia were retrospectively analyzed. All of the patients were monocular sickened, including idiopathic macular hole in 10 eyes, idiopathic macular pucker in 6, vitreoretinal traction syndrome in 4, and vitreous hemorrhage associated with branch retinal vein occlusion in 2. Peeling of epiretinal membrane and/or internal limiting membrane, intraocular laser coagulation, air-fluid exchange and tamponiding of C 3F 8 were performed according to the condition of diseases. The postoperative follow-up was 1-11 months, with the mean duration of 6.4 months. The effect of analgesia, cooperation with the patients, operative effect and complications in and after the surgery were observed. Results The operations finished successfully in all of the eyes under the topical anesthesia. The operation duration ranged from 20 to 25 minutes with average of 22 minutes. The patients cooperated with the doctor well without any discomfort. Two days after the surgery, edema of the wounded conjunctiva was found, and recovered 7 days later. A light pigment dot on the surface of the sclera could be seen at the first month. The complications included transient increasing of intraocular pressure in 2 eyes, feather-like opacity of lens in 5 eyes, vitreous hemorrhage in 1 eye, and air-bleb under conjunctiva in 2 eyes. No other complications related with the cut were found. The macular hole closed in 9 eyes with idiopathic macular hole, and the other 1 had the smaller but not closed hole. Idiopathic macular pucker, vitreoretinal traction syndrome, and vitreous hemorrhage associated with branch retinal vein occlusion were cured successfully. Conclusions Vitreoretinal surgery using the TSV25G under the topical anesthesia has many advantages such as simple procedure, short operation time, micro-invasion, less complications and rapid revovery, and mainly serves simple manipulation in some simple diseases such as idiopathic macular hole, vitreo-retinal traction syndrome, and simple hemorrhage.
Download This Paper Open PDF in Browser Add Paper to My Library Share: Permalink Using these links will ensure access to this page indefinitely Copy URL Copy DOI
This article presents experimental and theoretical studies of the impacting behavior of ferrofluid droplets on porous substrates under the influence of magnetic fields. The effects of magnetic field strength and porous substrates on the falling, impacting, and spreading of the droplets are investigated. Theoretical models are successfully derived to predict the droplet impacting velocity in the presence of the magnetic field and the maximum spreading factor of the droplets on the porous substrates without considering magnetic field effects, respectively. Moreover, a universal scaling law is constructed for the maximum spreading factor of the ferrofluid droplets on both of the porous and smooth substrates in the presence of the magnetic field. The findings of this study can provide a foundation for understanding the impacting dynamics of ferrofluid droplets on the substrates and optimizing their applications in various fields, such as three-dimensional printing and microfluidic technology.
This paper proposed a new reliable multicast transport protocol for mobile Ad hoc networks(MANETs).Reliable adaptive congestion controlled transport protocol(ReACT)combined source-based congestion and error control with receiver-initiated localized recovery,to recover from the different types of losses that may occur in MANETs.Through simulations,analyzed the performance of the protocol.The results prove that ReACT is the perfect performer in terms of reliability.
Multicolor carbon dots (CDs) with compatible physical and chemical properties have tremendous potential applications in full-color display and photoelectric devices. In this work, red, green, and blue-emissive CDs (R-, G-, and B-CDs) were synthesized from o-, m-, and p-phenylenediamine under identical reactions for the first time. Mechanism exploration has shown that the photoluminescence of G- and B-CDs was dominantly core-state emissions while that of R-CDs was also heavily influenced by surface-state emissions. Superior WLEDs were fabricated exploiting the three CDs as compositing white phosphors, emitting warm white light with a correlated color temperature of 3248 K, CIE coordinates of (0.41, 0.38), and a high color rendering index value of 93.2, surpassing most phenylenediamine-derived CDs WLEDs. Most importantly, the WLEDs also demonstrated high stabilities under different working conditions and environments, highlighting their practicality.
After the water pollution (WP) incident, it has caused a serious impact on the natural environment, people's health, residents' daily life, and social economy.It is more urgent to promote the economy and environment with high level and quality, which puts forward new requirements for environmental managers.In recent years, the prediction and early warning of water bodies using decision tree (DT) algorithm has received extensive attention.Therefore, this paper adopts the DT algorithm and establishes a WP early warning model (EWM) with the support of electronic information technology (EIT).This model is used to monitor a river reach and water quality indicators, analyze the changes of water quality parameters, and analyze the water quality status.This efficient and accurate prediction and early warning technology is conducive to timely response to WP events, which is of great significance for ecological protection and environmental decision-making.
TaN was widely used as Cu diffusion barrier in CMOS Cu-BEOL technology, in which it was removed by CMP process. Some work was done on TaN etch by Br/Cl-based gas for metal gate application. But seldom work was done for TaN etch in CF-based gas. In this work TaN etching in CF4/CHF3 gas was investigated on CVD alpha-Si substrate for CMOS compatible MEMS/Sensor application. To avoid resist poisoning problem of metal nitrides, a thin layer of SiON and oxide was deposited on TaN. The patterning sequence included 248 nm lithography, etching thin SiON and oxide, followed by TaN etching. It was found serious residue problem on the unpatterned area. After EDX check, Ta was found in the residue. Assumption was made for the mechanism of residue formation. Based on this model, the process was optimized and a 4-step etching process was developed. The main feature of this process is TaN etching in CF4/CHF3 gas with low power and pressure including a post-etching de-fencing process to solve the residue problem. The optimized process can well control the TaN etching profile and Si loss during TaN over-etch, and was successfully used in the MEMS/Sensor patterning process.
'/%3e%3cuse xlink:href='%23a' transform='rotate(23.036 .093 25.536)'/%3e%3cuse xlink:href='%23a' transform='rotate(45.87 1.273 16.18)'/%3e%3cuse xlink:href='%23a' transform='rotate(69.945 .996 12.078)'/%3e%3cuse xlink:href='%23a' transform='rotate(20.66 -19.689 31.932)'/%3e%3c/svg%3e)