The stacking fault formation during physical vapor transport growth of heavily nitrogen-doped (mid-10 19 cm −3 ) 4H-SiC crystals was investigated. Low-voltage scanning electron microscopy (LVSEM) observations detected the stacking fault formation on the (000-1) facet of heavily nitrogen-doped 4H-SiC crystals. Stacking faults showed characteristic morphologies, and atomic force microscopy (AFM) studies revealed that these morphologies of stacking faults stemmed from the interaction between surface steps and stacking faults. Based on these results, the stacking fault formation mechanism in heavily nitrogen-doped 4H-SiC crystals is discussed.
We report on the time-resolved study of the coherent coupled oscillation of excitonic quantum beats and GaAs-like longitudinal optical (LO) phonons in GaAs∕AlAs multiple quantum wells. The time-domain signals in GaAs∕AlAs multiple quantum wells observed by using a reflection-type pump-probe technique show the coherent coupled oscillation with fast dephasing time and the long-lived coherent GaAs-like LO phonon oscillation. Under the condition that the splitting energy of the heavy-hole and light-hole excitons is close to the energy of the GaAs-like LO phonon, the dependence of the coupled oscillation frequency on the splitting energy exhibits an anticrossing behavior. We discuss the dispersion relation of the coupled oscillation from the viewpoint of the linear coupling of the excitonic quantum beat and the GaAs-like LO phonon through the longitudinal polarization.
The formation mechanism of Shockley stacking faults (SFs) in 4H-SiC crystals is discussed on the basis of the quantum well action concept. Theoretical investigation of the energetics of the SF formation in 4H-SiC crystals reveals the underlying physics governing the SF formation under thermal equilibrium and non-thermal equilibrium conditions. The similarity and dissimilarity of the SF formation in these two conditions are discussed, and based on it, a unified understanding of the phenomena is attempted.
The step structure on the (0001¯)C facet of 4H-SiC boules grown by the physical vapor transport growth method with different nitrogen doping concentrations was examined in various scales, using different types of microscopy, such as differential interference contrast optical microscopy (DICM) and atomic force microscopy (AFM). DICM observations unveiled characteristic macroscopic surface features of the facet dependent on the nitrogen doping concentration. AFM observations revealed the existence of step trains of half unit-cell height (0.5 nm) on the facet and found that their separation was undulated with a characteristic wavelength dependent on the nitrogen doping concentration; the higher the nitrogen concentration, the longer was the undulation wavelength of step separation. Based on these results, we discussed the origin and formation mechanism of the separation-undulated step structure observed on the (0001¯)C facet of nitrogen-doped 4H-SiC boules.
The formation of single Shockley stacking faults (SSSFs) in 4H-SiC crystals under non-equilibrium conditions (e.g., the forward biasing of PiN diodes and ultraviolet light illumination) is a key phenomenon in the so-called bipolar degradation of SiC power devices. This study theoretically investigated the physical mechanism of this phenomenon based on the concept of quantum well action. As a first approximation describing the non-equilibrium state of the material, we employed quasi-Fermi level approximation. We then made improvements by considering several physical effects governing the carrier distribution near and in the SSSF. The improved model accounts well for the excitation threshold and the temperature dependence of SSSF expansion. Thus, the model provides useful insights into the driving force of SSSF expansion under non-equilibrium conditions.
We demonstrate a simple method for direct observation of the stacking orientation on 4H/6H-SiC {0001} surfaces by low-voltage SEM. The difference in the direction of the stacking orientation is observed as SEM contrast. By utilizing this technique, the bond configuration at {1-10n} steps can be determined by the SEM contrast.
Experimental and simulation studies were conducted for surface segregation-limited kinetics of nitrogen incorporation into a 4H-SiC crystal during physical vapor transport (PVT) crystal growth. It was revealed that the nitrogen incorporation is kinetically limited by the step-flow velocity on the growing crystal surface of a 4H-SiC crystal; in this study, the surface step-flow velocity at the growth front was deduced from the local inclination angle of the growth front measured from the (0001¯) plane, assuming a uniform growth rate along the c-axis (crystal growth direction) across the growth front, and the nitrogen concentration across the growth front was measured using Raman scattering microscopy. The step-flow velocity dependence of nitrogen incorporation was theoretically analyzed using a two-site-exchange model, and the simulated dependence using the model was in good agreement with the experimental data. On the basis of these experimental and simulation results, kinematical and energetical aspects of nitrogen incorporation at the growth front of a 4H-SiC crystal during PVT growth are discussed.
The strain fields in a 4H-SiC homo-epitaxial layer deposited on a nitrogen-doped 4H-SiC substrate were studied using Raman scattering microscopy. The cross-sectional (1-100) and (11-20) surfaces of the epitaxial substrate were examined through the peak shifts of several Raman-active phonon modes for 4H-SiC, and tensile strain was found along the direction of 4° off the c -axis at the epilayer/substrate interface. The effect of the facet trace in the substrate, which has a higher nitrogen concentration than the other parts of the substrate, was also studied. The tensile strain at the epilayer/substrate interface was found to be hardly enhanced for the epilayer deposited on the facet trace.
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