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Yoshihiro Tezuka
Yoshihiro Tezuka
Intel
Computer science
Architecture
Mask inspection
Optics
Extreme ultraviolet lithography
4
Papers
8
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Laser-assisted discharge produced plasma (LDP) EUV source for actinic patterned mask inspection (APMI) (Conference Presentation)
2021
Safak Sayan
Kishore K. Chakravorty
Yusuke Teramoto
Takahiro Shirai
Shunichi Morimoto
Hidenori Watanabe
Yoshihiko Sato
Kazuya Aoki
Ted Liang
Yoshihiro Tezuka
Marieke Jager
Firoz Ghadiali
Frank E. Abboud
Steven L. Carson
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Mask data processing in the era of multibeam writers
2014
Frank E. Abboud
Michael Asturias
Maesh Chandramouli
Yoshihiro Tezuka
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Citations (7)
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