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Marleen Kooiman
Marleen Kooiman
ASML Holding
Extreme ultraviolet lithography
Metrology
Computer science
Critical dimension
Wafer
3
Papers
1
Citations
0
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2024
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Evaluation of local CD and placement distribution on EUV mask and its impact on wafer
2019
Vidya Vaenkatesan
Paul van Adrichem
Marleen Kooiman
Michael Kubis
Lieve Van Look
Andreas Frommhold
Emily Gallagher
DS Nam
Jan Mulkens
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Massive metrology and failure identification for DRAM applications (Conference Presentation)
2019
Harm Dillen
Dorothe Oorschot
Marleen Kooiman
Willem van Mierlo
Ziyang Wang
Kang San Lee
Jinwoo Lee
Ruochong Fei
Shu-Yu Lai
Marc Kea
Inhwan Lee
Hwan Kim
Junghyun Kang
Jaehee Hwang
Chang-Moon Lim
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Massive CD metrology for EUV failure characterization and EPE metrology
2018
Harm Dillen
Yi Hsin Chang
Fei Wang
Marc Kea
Gijsbert Rispens
Marleen Kooiman
Fuming Wang
Stefan Hunsche
Daniel Tien
Peng Tang
Pengcheng Zhang
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