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Zoilo Cheng Ho Tan
Zoilo Cheng Ho Tan
Applied Materials
Analytical chemistry
Resist
Materials science
Lithography
Photoresist
3
Papers
5
Citations
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Potential of DNQ/novolac and chemically amplified resists for 100 nm device generation maskmaking
2001
Microelectronic Engineering
Zoilo Cheng Ho Tan
Phuong Le
Tom Coleman
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Epoxidized novolac resist (EPR) for high-resolution negative- and positive-tone electron beam lithography
2000
E. Tegou
Evangelos Gogolides
Panagiotis Argitis
I. Raptis
G. P. Patsis
N. Glezos
Zoilo Cheng Ho Tan
Kim Y. Lee
Phuong Le
Yautzong Hsu
Michael Hatzakis
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Evaluation of DNQ/novolac resists for 130 nm device maskmaking
1998
Microelectronic Engineering
Zoilo Cheng Ho Tan
Phuong Le
Homer Lem
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