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Yang Hee Jeong
Yang Hee Jeong
Chonnam National University
CMOS
Chemistry
Gate oxide
Fabrication
Photoresist
4
Papers
5
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Layout Dependent Induced Leakage and its Prevention with Different Shallow Trench Isolation Schemes in 0.18 µm Dual Gate Complementary Metal Oxide Semiconductor Technology
2007
Japanese Journal of Applied Physics
Seong-Yeol Mun
Kyeong-Cheol Shin
Sang-Bum Huh
Je Il Ju
Jae-Yeong Kim
Dae-Byung Kim
Seong Jun Kang
Yang Hee Jeong
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Thick Gate Oxide Integrity Improvement by Sulfuric Peroxide Mixture Cleaning after Thick Gate Oxide Etch
2006
Journal of The Electrochemical Society
Seong-Yeol Mun
Yoon Seong Jang
Young Sung Ko
Sang-Bum Huh
Jong-Kon Lee
Yang Hee Jeong
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Plasma-Damage-Induced Leakage Prevention Using Ozone Followed by SPM Solution Cleaning for Ion-Implanted Photoresist Strip
2006
Journal of The Electrochemical Society
Seong-Yeol Mun
Kyeong-Cheol Shin
Woon Il Choi
Jae Young Kim
Dae-Byung Kim
Seong Jun Kang
Yang Hee Jeong
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A Convenient Method for the Formation of p-Methoxylbenzyl Ethers and Esters over Perfluorinated Resinsulfonic Acid (Nafion-H)
1992
Bulletin of The Korean Chemical Society
Cho Bong Rae
Yang Hee Jeong
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Citations (2)
1