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Jerry C. Shaw
Jerry C. Shaw
IBM
Optics
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Materials science
Photoresist
Physics
7
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17
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Postexposure bake as a process-control parameter for chemically amplified photoresist
1993
John L. Sturtevant
Steven J. Holmes
Theodore G. Van Kessel
Philip C. D. Hobbs
Jerry C. Shaw
Robert R. Jackson
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Method of controlling photoengraving tool
1991
William D. Hopewell
Robert R. Jackson
Jerry C. Shaw
Kessel Theodore G Van
uiriamu dan hoopuueru
zierii kaaruton syoo
teodoa zieraado vu a n kesseru
robaato rasseru jakuson
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The effect of firing on berea sandstone
1991
Jerry C. Shaw
Peter L. Churcher
Blaine F. Hawkins
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