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A.V. Samoilov
A.V. Samoilov
Applied Materials
Transistor
Electronic engineering
PMOS logic
Epitaxy
Materials science
2
Papers
79
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35% drive current improvement from recessed-SiGe drain extensions on 37 nm gate length PMOS
2004
VLSIT | Symposium on VLSI Technology
P. R. Chidambaram
Brian A. Smith
Lindsey H. Hall
H. Bu
Srinivasan Chakravarthi
Yihwan Kim
A.V. Samoilov
A.T. Kim
P.J. Jones
Richard B. Irwin
Moon J. Kim
Antonio L. P. Rotondaro
C. Machala
Douglas T. Grider
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Citations (78)
Epitaxially strained SiGe process to improve mobility in the PMOS transistor
2004
P. R. Chidambaram
Brian A. Smith
Lindsey H. Hall
H. Bu
Srinivasan Chakravarthi
Yihwan Kim
A.V. Samoilov
A.T. Kim
P.J. Jones
Richard B. Irwin
Moon J. Kim
C. Machala
Douglas T. Grider
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Citations (1)
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