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D. Linten
D. Linten
Electronic engineering
Electrical engineering
CMOS
Voltage
Scaling
6
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15
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Si,GeおよびIII/Vチャネルを用いたFinFETとGAA北西部における自己加熱【Powered by NICT】
2016
Erik Bury
B. Kaczer
D. Linten
Liesbeth Witters
Hans Mertens
Niamh Waldron
X. Zhou
Nadine Collaert
Naoto Horiguchi
Alessio Spessot
Guido Groeseneken
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SOFT ERRORS AND NBTI IN SiGe pMOS TRANSISTORS D. M FleetwoodJ*, E. X ZhangJ, G. X DuanJ, C. X ZhangJ, 1. K. SamselJ, N. C. HootenJ,
2014
W G. Bennet
R. D. Schrimpf
R. A. ReedJ
D. Linten
J Mitarct
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ofthetransistor, heavily attenuating thepossible residual voltage overshoot attheinput fortheESDfrequency range, Integrated designs indeep-submicron CMOS require ESD andthusincreasing theprotection level. protection fortheir I/Opins. Since CMOS scaling drastically
2007
J. Borremans
Steven Thijs
P. Wambacql
D. Linten
Leuven Imec
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Impact of scaling on analog/RF CMOS performance
2004
SSICT | International Conference on Solid-State and Integrated Circuits Technology
Abdelkarim Mercha
Wutthinan Jeamsaksiri
J. Ramos
Snezana Jenei
Stefaan Decoutere
D. Linten
P. Wambacq
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Citations (15)
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