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Chi-Hsi Jeff Wu
Chi-Hsi Jeff Wu
Optoelectronics
Oxide
Gate dielectric
Leakage (electronics)
Computer science
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Investigation of BEOL plasma process induced damage effect on gate oxide
2015
RAMS | Reliability and Maintainability Symposium
Lingxiao Cheng
Xiaofeng Xu
Chi-Hsi Jeff Wu
Jung-Che Venson Chang
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