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Tae Hyun Kim

Yeungnam University

8

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119

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Atomic layer deposition of WNx thin films using a F-free tungsten metal-organic precursor and NH3 plasma as a Cu-diffusion barrier

2019 Thin Solid Films
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Some insights into atomic layer deposition of MoNx using Mo(CO)6 and NH3 and its diffusion barrier application

2019 Chemistry of Materials
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Atomic-Layer-Deposited MoNx Thin Films on Three-Dimensional Ni Foam as Efficient Catalysts for the Electrochemical Hydrogen Evolution Reaction

2019 ACS Applied Materials & Interfaces
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Low-temperature direct synthesis of high quality WS2 thin films by plasma-enhanced atomic layer deposition for energy related applications

2018 Applied Surface Science
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Low temperature atomic layer deposited molybdenum nitride-Ni-foam composite: An electrode for efficient charge storage

2018 Electrochemistry Communications
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