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Markus Bender
Markus Bender
Infineon Technologies
Process window
Architecture
Extreme ultraviolet
Extreme ultraviolet lithography
Optics
2
Papers
8
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0
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Comparison of EUV mask architectures by process window analysis
2005
Siegfried Schwarzl
Frank-Michael Kamm
Stefan Hirscher
Klaus Lowack
Wolf-Dieter Domke
Markus Bender
Stefan Wurm
Adam R. Pawloski
Bruno La Fontaine
Christian Holfeld
Uwe Dersch
Florian Letzkus
Joerg Butschke
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Citations (3)
Comparative study of mask architectures for EUV lithography
2004
Adam R. Pawloski
Bruno La Fontaine
Harry J. Levinson
Stefan Hirscher
Siegfried Schwarzl
Klaus Lowack
Frank-Michael Kamm
Markus Bender
Wolf-Dieter Domke
Christian Holfeld
Uwe Dersch
Patrick P. Naulleau
Florian Letzkus
Joerg Butschke
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Citations (5)
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