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Tomas Marangoni
Tomas Marangoni
DuPont
Photochemistry
Resist
Materials science
Polymer
Strategic design
3
Papers
1
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0
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Design considerations for chemically amplified EUV resist materials
2021
Emad Aqad
Choong-Bong Lee
Suzanne M. Coley
Ke Yang
Li Cui
Manibarsha Goswami
Bhooshan C. Popere
Tomas Marangoni
James F. Cameron
James W. Thackeray
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Direct Correlation of Single-Particle Motion to Amorphous Microstructural Components of Semicrystalline Poly(ethylene oxide) Electrolytic Films.
2020
Journal of Physical Chemistry Letters
Trevor D. Roberts
Rongfeng Yuan
Limin Xiang
Milan Delor
Ravi Pokhrel
Ke Yang
Emad Aqad
Tomas Marangoni
Peter Trefonas
Ke Xu
Naomi S. Ginsberg
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Understanding of Strategic Design of Resist Formulation Through Studying of Quencher-Functional Component and Those Contributions to High Resolution Patterning
2019
Journal of Photopolymer Science and Technology
Choong-Bong Lee
James Park
Charlotte Cutler
Jason DeSisto
Rochelle Rena
Tomas Marangoni
Emad Aqad
James W. Thackeray
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