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Motokazu Yuasa

National Archives and Records Administration

7

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Formation of Silicon Oxynitride Films with Low Leakage Current Using N2/O2 Plasma near Atmospheric Pressure

2004 Japanese Journal of Applied Physics
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Procede et dispositif de traitement au plasma atmospherique

2001
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Fabrication of Diamond Films at Low Pressure and Low-Temperature by Magneto-Active Microwave Plasma Chemical Vapor Deposition.

1994 Japanese Journal of Applied Physics
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Low temperature diamond film fabrication using magneto-active plasma CVD

1992 Diamond and Related Materials
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Fabrication of diamond films under high density helium plasma formed by electron cyclotron resonance

1991 Surface & Coatings Technology
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Citations (3)