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Sungeun Hong
Sungeun Hong
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Lithography
Materials science
Polymer
Coating
Photolithography
2
Papers
5
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Acid diffusion characteristics of RELACS coating for 193-nm lithography
2004
Sungeun Hong
Takeshi Nishibe
Tetsuo Okayasu
Kiyohisa Takahashi
Yusuke Takano
Wen-Bing Kang
Hatsuyuki Tanaka
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Citations (4)
Advanced RELACS (resolution enhancment of lithography by assist of chemical shrink) material for 193-nm lithography
2003
Sungeun Hong
Yusuke Takano
Takashi Kanda
Takanori Kudo
Munirathna Padmanaban
Hatsuyuki Tanaka
Si-Hyeung Lee
Jung-Hyeon Lee
Sang Gyun Woo
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Citations (1)
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