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T. Kaesebier
T. Kaesebier
Dry etching
Lithography
Optoelectronics
Electron-beam lithography
Nanotechnology
2
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9
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ブラックシリコンで応答性を高めたGe-オン-Siフォトダイオード
2015
Applied Physics Letters
Martin Steglich
Michael Oehme
T. Kaesebier
Matthias Zilk
K. Kostecki
Kley E.-b.
Joerg Schulze
A. Tuennermann
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Application of double patterning technology to fabricate optical elements: Process simulation, fabrication, and measurement
2012
Journal of Vacuum Science & Technology. B. Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
Sergey Babin
G. Glushenko
Thomas Weber
T. Kaesebier
Ernst-Bernhard Kley
Adriana Szeghalmi
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Citations (9)
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