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E.J.T. Smulders
E.J.T. Smulders
Materials science
Analytical chemistry
Reactive-ion etching
Etching
Ion
3
Papers
347
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Guidelines for etching silicon MEMS structures using fluorine high-density plasmas at cryogenic temperatures
2002
IEEE\/ASME Journal of Microelectromechanical Systems
M.J. de Boer
Johannes G.E. Gardeniers
Henri V. Jansen
E.J.T. Smulders
M.J. Gilde
G. H. M. Roelofs
J. N. Sasserath
Michael Curt Elwenspoek
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Citations (234)
RIE lag in high aspect ratio trench etching of silicon
1997
Microelectronic Engineering
Henricus V. Jansen
Meint J. de Boer
Remco J. Wiegerink
Niels Roelof Tas
E.J.T. Smulders
Christina Neagu
Miko C. Elwenspoek
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Citations (113)
The micro mussel enhanched sensor array: a novel sensor concept
1997
T.M. Koster
Stefan Sanchez
G.J. Veldhuis
E.J.T. Smulders
R.E. Oosterbroek
Joost Conrad Lötters
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