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Zhongxian Li

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Hardmask composition, using a method which comprises forming a pattern of a semiconductor integrated circuit device and the pattern

2014
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Hardmask composition, using a method which comprises forming a pattern of a semiconductor integrated circuit device and the pattern

2014
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Composite line structure

2013
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Method for forming a dual damascene structure of a semiconductor device, and a semiconductor device therewith

2013
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Monomer, the monomer containing hard mask compositions and the use of the hard mask composition of this patterning method

2013
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