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John Zabasajja
John Zabasajja
HRL Laboratories
Diamond
Materials science
Chemical-mechanical planarization
Conditioners
Abrasive
4
Papers
10
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0
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2024
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Advanced CMP conditioning for front end applications
2015
John Zabasajja
Terry Pfau
Rob Rhoades
Jennifer Sokol
Matt Fritz
Vince Laraia
Noah Shanti
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Citations (1)
Microreplicated Conditioners for Cu Barrier Chemical-Mechanical Planarization (CMP)
2015
ECS Journal of Solid State Science and Technology
Wei-Tsu Tseng
Sana Rafie
Adam Ticknor
Vamsi Devarapalli
Connie Truong
Christopher Majors
John Zabasajja
Jennifer Sokol
Vince Laraia
Matt Fritz
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Citations (8)
3M microreplicated Trizact TM pad conditioners for FEOL tungsten plug and metal gate applications
2014
John Zabasajja
Jennifer Sokol
Vince Laraia
Matthew Fritz
Junqing Xie
Charles Gould
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Microreplicated pad conditioner for copper and copper barrier CMP applications
2014
Wei-Tsu Tseng
Sana Rafie
Adam Ticknor
Vamsi Devarapalli
Elliott Rill
John Zabasajja
Jennifer Sokol
Vince Laraia
Matt Fritz
Chuck Gould
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