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chentianniu

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Selectively Removing Titanium Nitride Hard Mask and Etch Residue Removal

2016
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Compositions and methods of selectively etching a metal nitride

2011
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The antimony useful for the CVD/ALD of metallic film and germanium complexes

2007
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For the metal thin film cvd / ald useful antimony compound and germanium

2007
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