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Hideo Shimizu
Hideo Shimizu
Sony Broadcast & Professional Research Laboratories
Lithography
Optics
Phase-shift mask
Phase (waves)
Resist
5
Papers
9
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ArF lithography technologies for 65 nm-node CMOS (CMOS5) with 30 nm logic gate and high density embedded memories
2003
VLSIT | Symposium on VLSI Technology
Kohji Hashimoto
Fumikatsu Uesawa
Kazuhiro Takahata
Koji Kikuchi
Hideki Kanai
Hideo Shimizu
Eishi Shiobara
Koichi Takeuchi
Ayako Endo
Hideaki Harakawa
Shoji Mimotogi
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Experimental Verification of an Aerial Image Evaluation Method and Its Application to Studies of Attenuated Phase-Shifting Masks
1995
Japanese Journal of Applied Physics
Hideo Shimizu
Fumikatsu Uesawa
Tatsuji Oda
Minoru Sugawara
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New systematic evaluation method for attenuated phase-shifting mask specifications
1995
Japanese Journal of Applied Physics
Ichiro Kagami
Minoru Sugawara
Hiroichi Kawahira
Keisuke Tsudaka
Kiichi Ishikawa
Satoru Nozawa
Hideo Shimizu
Tohru Ogawa
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Subquarter micron optical lithography with practical superresolution technique
1995
Tohru Ogawa
Masaya Uematsu
Fumikatsu Uesawa
Mitsumori Kimura
Hideo Shimizu
Tatsuji Oda
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Estimation of attenuated phase-shifting mask fabrication latitude using an optical exposure-defocus methodology
1994
Minoru Sugawara
Hiroichi Kawahira
Keisuke Tsudaka
Akihiro Ogura
Satoru Nozawa
Fumikatsu Uesawa
Hideo Shimizu
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