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Brent E. Boerger
Brent E. Boerger
Lithography
Collimated light
Laser
Resist
Optics
3
Papers
4
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High-power laser-produced plasma source for nanolithography
2004
Richard Forber
Celestino J. Gaeta
Harry Rieger
Heinz Siegert
Scott McLeod
Brent E. Boerger
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Collimated laser-plasma lithography (CPL) for 90-nm and smaller contacts and vias
2004
Richard Forber
Celestino J. Gaeta
Heinz Siegert
Scott McLeod
Brent E. Boerger
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Advances in CPL, collimated plasma source, and full-field exposure for sub-100-nm lithography
2003
Brent E. Boerger
Scott McLeod
Richard Forber
I. C. Edmond Turcu
Celestino J. Gaeta
Donald K. Bailey
Jacob Ben-Jacob
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