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Naka Onoda
Naka Onoda
NEC
Electron-beam lithography
Fabrication
Cell projection
Resist
Dram
4
Papers
7
Citations
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Defect Reduction in ArF Immersion Lithography Using Particle Trap Wafers With CVD Thin Films
2008
ISSM | International Symposium on Semiconductor Manufacturing
Yoshinori Matsui
Naka Onoda
Seiji Nagahara
Takayuki Uchiyama
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Improved 0.12 /spl mu/m EB direct writing for Gbit DRAM fabrication
1998
VLSIT | Symposium on VLSI Technology
Ken Nakajima
Hiroshi Yamashita
Yoshikatsu Kojima
Takao Tamura
Yasuhisa Yamada
Kenichi Tokunaga
Takahiro Ema
Kenji Kondoh
Naka Onoda
Hiroshi Nozue
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Highly accurate stitching method between cell projection and variably shaped e-beam shots
1998
Yoshikatsu Kojima
Naka Onoda
Kenichi Tokunaga
Ken Nakajima
Hiroshi Nozue
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0.15 µm Electron Beam Direct Writing for Gbit Dynamic Random Access Memory Fabrication
1997
MNC | International Microprocesses and Nanotechnology Conference
Ken Nakajima
Hiroshi Yamashita
Yoshikatsu Kojima
Satomi Hirasawa
Takao Tamura
Yasuhisa Yamada
Kenichi Tokunaga
Takahiro Ema
Kenji Kondoh
Naka Onoda
Hiroshi Nozue
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Citations (3)
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