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Mary Jane Brodsky
Mary Jane Brodsky
IBM
Process window
Lithography
Design for manufacturability
Photolithography
Engineering
3
Papers
34
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Trilayer Development for 193 nm Immersion Lithography
2007
Journal of Photopolymer Science and Technology
Sean D. Burns
Martin Burkhardt
Dario L. Goldfarb
Naftali E. Lustig
Dirk Pfeiffer
Mary Jane Brodsky
Alexandra Clancy
David R. Medeiros
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Citations (12)
Process-window sensitive full-chip inspection for design-tosilicon optimization in the sub-wavelength era
2005
ASMC | Advanced Semiconductor Manufacturing Conference
Mary Jane Brodsky
Scott Halle
V. Jophlin-Gut
Lars W. Liebmann
Donald J. Samuels
Gary Crispo
Kourosh Nafisi
Vijay Ramani
Ingrid B. Peterson
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Citations (12)
Process-window sensitive full-chip inspection for design-to-silicon optimization in the sub-wavelength era
2005
Advanced Semiconductor Manufacturing Conference
Mary Jane Brodsky
Scott Halle
Vickie Jophlin-Gut
Lars W. Liebmann
Don Samuels
Gary Crispo
Kourosh Nafisi
Vijay Ramani
Ingrid B. Peterson
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Citations (10)
1