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Rui Chen
Rui Chen
GlobalFoundries
Atomic layer deposition
Nanotechnology
Optics
Back end of line
Multiple patterning
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Line end shortening and iso-dense etch bias improvement by ALD spacer shrink process
2017
Proceedings of SPIE
Rui Chen
Granger Lobb
Aleksandra Clancy
Bradley Morgenfeld
Shyam Pal
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