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hamada tosimasa
hamada tosimasa
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光酸化膜とSiH 4 とN 2 OガスからのPECVD膜を積層した低温多結晶Si薄膜トランジスタ用ゲート絶縁膜
2002
nakada yukihiko
okamoto tetuya
itoga takasi
hamada tosimasa
isii hirosi
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