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Benjamin M. Rathsack
Benjamin M. Rathsack
University of Texas at Austin
Materials science
Wafer fabrication
Photoresist
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Photomask
3
Papers
69
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Hydrogel biosensor array platform indexed by shape
2004
Chemistry of Materials
Jason E. Meiring
Matthew J. Schmid
Scott M. Grayson
Benjamin M. Rathsack
David M. Johnson
Romy Kirby
Ramakrishnan Kannappan
Kalpana Manthiram
Benjamin Hsia
Zachary Hogan
Andrew D. Ellington
Michael V. Pishko
C. G. Willson
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Citations (66)
Process Development for 257 nm Photomask Fabrication Using Environmentally Stable Chemically Amplified Photoresists
2001
Jeffrey A. Albelo
Benjamin M. Rathsack
Peter Pirogovsky
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Citations (3)
Process development for 257 nm photomask fabrication using environmentally stable chemically amplified photoresists
2001
Jeffrey A. Albelo
Benjamin M. Rathsack
Peter Pirogovsky
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