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Taiga Horiguchi

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WS2 Film by Sputtering and Sulfur-Vapor Annealing, and its pMISFET with TiN/HfO2 Top-Gate Stack, TiN Bottom Contact, and Ultra-Thin Body and Box

2021 IEEE Journal of the Electron Devices Society
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High Seebeck coefficient in PVD-WS2 film with grain size enlargement

2021 Japanese Journal of Applied Physics
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Sheet resistance reduction of Sputtered MoS 2 Film by Cl 2 Plasma Treatment

2019 The Japan Society of Applied Physics
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