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Hong Keun Chung
Hong Keun Chung
Hanyang University
Chemical engineering
Atomic layer deposition
Ferroelectricity
Thin film
Impurity
3
Papers
4
Citations
0
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Atomic-Layer Deposition of TiO2 Thin Films with a Thermally Stable (CpMe5)Ti(OMe)3 Precursor
2021
Applied Surface Science
Hong Keun Chung
Sung-Ok Won
Yongjoo Park
Jinsang Kim
Tae Joo Park
Seong Keun Kim
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Effects of oxygen sources on properties of atomic-layer-deposited ferroelectric hafnium zirconium oxide thin films
2021
Ceramics International
Ah-Jin Cho
Jihoon Jeon
Hong Keun Chung
In Hwan Baek
Kun Yang
Min Hyuk Park
Seung Hyub Baek
Seong Keun Kim
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Investigation of phases and chemical states of tin titanate films grown by atomic layer deposition
2020
Journal of Vacuum Science and Technology
Hong Keun Chung
Jung Joon Pyeon
In Hwan Baek
Ga Yeon Lee
Hansol Lee
Sung-Ok Won
Jeong Hwan Han
Taek Mo Chung
Tae Joo Park
Seong Keun Kim
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