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Anthony Blackburn
Anthony Blackburn
University of Southampton
Plasma
Biasing
Etch pit density
Selectivity
Analytical chemistry
2
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1
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<<<<<<<<<<<<<<<<<<<<<<<<<<<<<<<<<<<<<<<<<<<<<<<< Springfield Men's Walk # 41 TEAM
2011
Springfield Area Emmaus
Greg Bachman
Rev William Kelly
Norm Moore
Dene Voorhees
Brett Boblitt
Greg Stout
John Baugh
Jim Mayhugh
Tom Myers
Jim Yoakem
Anthony Blackburn
Jacob Berner
Rick Smith
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The selectivity of poly Si and SiO2 etching using a negative dc biasing of powered electrode
1986
Vacuum
Jozef Brčka
Rudolf Harman
Anthony Blackburn
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