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Ting Cheong Ang
Ting Cheong Ang
Nanyang Technological University
Materials science
Silicon nitride
Oxide
Substrate (chemistry)
X-ray photoelectron spectroscopy
5
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12
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In-line plasma induced charging monitor for 0.15 /spl mu/m polysilicon gate etching
2001
PPID | International Symposium on Plasma Process-Induced Damage
Daniel Chong
Won Jong Yoo
Ting Cheong Ang
Sang Yee Loong
Randall Cher Liang Cha
Pin Hian Lee
N. Layadi
Lap Chan
Alex See
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Improvement on lithography pattern profile by plasma treatment
1999
Journal of Vacuum Science and Technology
Choi Pheng Soo
A. J. Bourdillon
S. Valiyaveettil
A. Huan
Andrew Thye Shen Wee
M. H. Fan
Ting Cheong Ang
Lap Chan
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Enhancement or reduction of catalytic dissolution reaction in chemically amplified resists by substrate contaminants
1999
IEEE Transactions on Semiconductor Manufacturing
Choi Pheng Soo
S. Valiyaveettil
A. Huan
Andrew Thye Shen Wee
Ting Cheong Ang
M. H. Fan
A. J. Bourdillon
Lap Chan
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Enhancement or reduction of catalytic dissolution reaction in chemically amplified resists by substrate contaminants
1999
IEEE Transactions on Semiconductor Manufacturing
Choi Pheng Soo
S. Valiyaveettil
A. Huan
Andrew Thye Shen Wee
Ting Cheong Ang
M. H. Fan
A. J. Bourdillon
Lap Chan
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