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Ken Holman
Ken Holman
National Semiconductor
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Design of 200nm, 170nm, 140nm DUV contact sweeper high transmission attenuating phase shift mask : Experimental results Part 2
1999
Robert Socha
Xuelong Shi
Ken Holman
Mircea Dusa
Will Conley
John S. Petersen
Fung Chen
Tom Laidig
Kurt E. Wampler
Roger F. Caldwell
M. C. Chu
C. Su
K. Huang
Connie Chen
Feng Wang
Chin Aik Le
C. Pierrat
Bo Su
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Citations (1)
Design of 200-nm, 170-nm, and 140-nm DUV contact sweeper high-transmission attenuating phase-shift mask: II. Experimental results
1999
Robert John Socha
Xuelong Shi
Ken Holman
Mircea Dusa
Will Conley
John S. Petersen
J. Fung Chen
Thomas Laidig
Kurt E. Wampler
Roger F. Caldwell
M. C. Chu
Chung-jen. Su
Kuei-Chun Hung
Connie Chen
Feng Wang
Chin Aik Le
Christophe Pierrat
Bo Su
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Citations (3)
1