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Michiel Van Daele
Michiel Van Daele
Atomic layer deposition
Materials science
Plasma
Inorganic chemistry
Scanning electron microscope
3
Papers
13
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Atomic layer deposition of localised boron- and hydrogen-doped aluminium oxide using trimethyl borate as a dopant precursor
2019
Felix Mattelaer
Michiel Van Daele
Matthias Minjauw
Timo Sajavaara
Jolien Dendooven
Christophe Detavernier
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Plasma enhanced atomic layer deposition of silver using the Ag(fod)(PEt₃)-precursor and NH₃-plasma
2017
Matthias Minjauw
Eduardo Solano Minuesa
Sree Pulinthanathu Sree
Ramesh Asapu
Michiel Van Daele
Ranjith Karuparambil Ramachandran
Sammy W. Verbruggen
Silvia Lenaerts
Johan A. Martens
Christophe Detavernier
Jolien Dendooven
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Plasma-Enhanced Atomic Layer Deposition of Silver Using Ag(fod)(PEt3) and NH3-Plasma
2017
Chemistry of Materials
Matthias Minjauw
Eduardo Solano
Sreeprasanth Pulinthanathu Sree
Ramesh Asapu
Michiel Van Daele
Ranjith Karuparambil Ramachandran
Gino Heremans
Sammy W. Verbruggen
Silvia Lenaerts
Johan A. Martens
Christophe Detavernier
Jolien Dendooven
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Citations (13)
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