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Foisy C. Mark
Foisy C. Mark
Freescale Semiconductor
Metallurgy
Materials science
Inorganic chemistry
Arsenic
Silicon
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An Experimental and Simulation Study of Arsenic Diffusion Behavior in Point Defect Engineered Silicon
2007
MRS Proceedings
Ning Kong
Taras A. Kirichenko
Gyeong S. Hwang
Foisy C. Mark
Steven G. H. Anderson
Sanjay K. Banerjee
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