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Mark L. O’Neill
Mark L. O’Neill
Air Products & Chemicals
Thin film
Atomic layer deposition
Inorganic chemistry
Dielectric
Photochemistry
4
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62
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First-Principles Study of a Full Cycle of Atomic Layer Deposition of SiO2 Thin Films with Di(sec-butylamino)silane and Ozone
2013
Journal of Physical Chemistry C
Liang Huang
Bo Han
Bing Han
Agnes Derecskei-Kovacs
Manchao Xiao
Xinjian Lei
Mark L. O’Neill
Ronald Martin Pearlstein
Haripin Chandra
Hansong Cheng
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Citations (12)
On the Mechanisms of SiO2 Thin-Film Growth by the Full Atomic Layer Deposition Process Using Bis(t-butylamino)silane on the Hydroxylated SiO2(001) Surface
2012
Journal of Physical Chemistry C
Bo Han
Qingfan Zhang
Jinping Wu
Bing Han
Eugene Joseph Karwacki
Agnes Derecskei
Manchao Xiao
Xinjian Lei
Mark L. O’Neill
Hansong Cheng
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Citations (37)
Structural characterization of a porous low-dielectric-constant thin film with a non-uniform depth profile
2002
Applied Physics Letters
Eric K. Lin
Hae-Jeong Lee
Gary W. Lynn
Wen Li Wu
Mark L. O’Neill
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Citations (13)
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