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Tatuki Nouda
Tatuki Nouda
Inductively coupled plasma
Plasma
Voltage
Plasma etching
Analytical chemistry
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25
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RF Self-Bias Characteristics in Inductively Coupled Plasma
1993
Japanese Journal of Applied Physics
Takayuki Fukasawa
Tatuki Nouda
Akihiro Nakamura
Haruo Shindo
Yasuhiro Horiike
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