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A.A. Vdovenkov
A.A. Vdovenkov
Analytical chemistry
Materials science
Silicon
Thin film
Physical vapor deposition
4
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4
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Effects of photoassisted deposition and/or photoassisted annealing on characteristics of ZnS:Mn thin-film electroluminescent devices
2003
Journal of Crystal Growth
N. A. Vlasenko
Z. L. Denisova
Ya. F. Kononets
Yu.V. Kopytko
L. I. Veligura
A.A. Vdovenkov
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Plasma-chemical reactor with low ion energy for selective etching
2000
ICMC | International Crimean Microwave Conference
V.V. Ustalov
O.A. Fedorovich
A.A. Vdovenkov
S.K. Levitskaja
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P1.5:CHANGE OF CHARACTERISTICS OF ALE SrS:Cu ACTFEL DEVICES AFTER PREAGING(Session P1:EL Poster Session)(Report on 5th International Display Phosphor Conference)
2000
N. A. Vlasenko
Ya. F. Kononets
Z. L. Denisova
Yu.V. Kopytko
L. I. Veligura
A.A. Vdovenkov
Yu. A. Tsyrkunov
E Soininen
G. Harkonen
A. Ahola
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AES studies of the realistic n-Si(111) surface with adsorbed gadolinium
1985
E. V. Buzaneva
A.A. Vdovenkov
T.A Vdovenkova
M.I. Gorodyskij
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