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yakobusu mateusu baazerumansu yohanesu
yakobusu mateusu baazerumansu yohanesu
Lithography
Materials science
Interference (wave propagation)
Electronic engineering
Optoelectronics
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Pre-wetting of the substrate before the immersion exposure
2009
arekusandaa hoogendamu kurisuteiaan
yohanesu sofia maria merutensu zieroon
nikoraasu ramuberutousu donderusu syuuruto
syutoreefukeruku bobu
kyasarinusu hyuuberutousu murukensu yohanesu
yakobusu mateusu baazerumansu yohanesu
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Lithographic apparatus and device manufacturing method using an interference exposure and other exposure
2007
tuegeru touruusuto kaarusu
syaauddo guriniiku zieemusu
yakobusu mateusu baazerumansu yohanesu
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Method of generating a mask pattern, a device manufacturing method, a computer program, the lithographic apparatus, and pattern corrector
2005
tueegeru toroosuto kaazu
deederikku fu a n deru masyuto kareru
yakobusu mateusu baazerumansu yohanesu
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マスク・パターンを生成する方法、デバイス製造方法、コンピュータ・プログラム、リソグラフィ装置、及びパターン補正器
2005
tueegeru toroosuto kaazu
deederikku fu a n deru masyuto kareru
yakobusu mateusu baazerumansu yohanesu
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