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A. Efremov
A. Efremov
Institute of Chemical Technology in Prague
Dry etching
Electron temperature
Langmuir probe
Plasma
Mixing ratio
1
Papers
4
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Comparative study of CF4- and CHF3-based plasmas for dry etching applications
2016
Thin Solid Films
A. Efremov
K-H Kwon
A. Morgunov
D. Shabadarova
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Citations (4)
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