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R. Charavel
R. Charavel
ON Semiconductor
Engineering
Electrical engineering
Electronic engineering
Oxide
Impact ionization
2
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14
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New VDMOS structure with Discontinuous Thick Inter-Body Oxide to reduce gate-to-drain charge
2010
ISPSD | International Symposium on Power Semiconductor Devices and IC's
Jaume Roig
S. Mouhoubi
P. Gassot
R. Charavel
A. Suvkhanov
Peter Moens
Filip Bauwens
Marnix Tack
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Citations (3)
Next generation of Deep Trench Isolation for Smart Power technologies with 120 V high-voltage devices
2010
Microelectronics Reliability
R. Charavel
Jaume Roig
S. Mouhoubi
P. Gassot
Filip Bauwens
Piet Vanmeerbeek
B. Desoete
Peter Moens
E. De Backer
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Citations (11)
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