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Crystal Wang
Crystal Wang
Semiconductor Manufacturing International Corporation
Engineering
Photolithography
Reticle
Photomask
Haze
4
Papers
3
Citations
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Ultra-Trace Sulfate Ion Removal on Photomasks for Haze Reduction
2016
Solid State Phenomena
Eric Guo
Crystal Wang
Sandy Qian
Mars Wang
Harry Zhang
Keanu Wu
Jian Shen
Wei Jiang
Fei Xu
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Improve mask inspection capacity with Automatic Defect Classification (ADC)
2013
Crystal Wang
Steven Ho
Eric Guo
Kechang Wang
Suresh Lakkapragada
Jiao Yu
Peter Hu
Vikram Tolani
Linyong Pang
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Implementation of new reticle inspection technology for progressive mask defect detection strategy in wafer fabs
2008
Cathy Liu
Alex Lu
Crystal Wang
Eric Guo
Dongsheng Fan
Lisa Yun
Steven Liu
Raj Badoni
Eric Haodong Lu
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Implementation of an efficient defect classification method in photomask mass production
2007
Cathy Liu
Crystal Wang
Skin Zhang
Eric Guo
Steven Liu
Eric Haodong Lu
Dongsheng Fan
Den Wang
Weiming Ma
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