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Atsushi Sano
Atsushi Sano
Hitachi
Analytical chemistry
Physics
Chemical vapor deposition
Thin film
Dielectric
5
Papers
40
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Production-Worthy HfSiON Gate Dielectric Fabrication Enabling EOT Scalability Down to 0.86 nm and Excellent Reliability by Polyatomic Layer Chemical Vapor Deposition Technique
2007
The Japan Society of Applied Physics
Dai Ishikawa
Satoshi Kamiyama
Atsushi Sano
Sadayoshi Horii
Takayuki Aoyama
Yasuo Nara
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Citations (1)
Impact of In situ Postnitridation Annealing for Successful Fabrication of HfSiON Thin Film
2007
Japanese Journal of Applied Physics
Sadayoshi Horii
Dai Ishikawa
Atsushi Sano
Yoshinori Imai
Yasuo Kunii
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Citations (4)
Electrical and physical characterization of remote plasma oxidized HfO/sub 2/ gate dielectrics
2006
IEEE Transactions on Electron Devices
K. Yamamoto
W. Deweerd
Marc Aoulaiche
M. Houssa
S. De Gendt
Sadayoshi Horii
Masayuki Asai
Atsushi Sano
Shigenori Hayashi
Masaaki Niwa
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Citations (7)
Enhancing memory efficiency of Si nanocrystal floating gate memories with high-κ gate oxides
2006
Applied Physics Letters
Prakaipetch Punchaipetch
Yukiharu Uraoka
Takashi Fuyuki
Atsushi Tomyo
Eiji Takahashi
Tsukasa Hayashi
Atsushi Sano
Sadayoshi Horii
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Citations (28)
Dispositif de traitement de substrat et procede pour la production de dispositifs a semi-conducteur
2004
Masayuki Asai
Sadayoshi Horii
Hideharu Itatani
Atsushi Sano
Hidehiro Yanai
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1