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Boo-Deuk Kim
Boo-Deuk Kim
Samsung
Materials science
Polymer
Lithography
Organic chemistry
Polymer chemistry
3
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22
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Synthesis of ArF photoresist polymer composed of three methacrylate monomers via reversible addition-fragmentation chain transfer (RAFT) polymerization
2011
Macromolecular Research
Hae-Sung Sohn
Sang-Ho Cha
Won-Ki Lee
Dong-Gyun Kim
Hyo-Jin Yun
Myung-sun Kim
Boo-Deuk Kim
Young-Ho Kim
Jae-Woo Lee
Jeong-Sik Kim
Deog-Bae Kim
Jae Hyun Kim
Jong-Chan Lee
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Citations (21)
Analysis of solvent effect to control the BARC coating uniformity
2004
Min-Ho Jung
Sangwoong Yoon
Eun-Soon Chung
Beom-Sang Yoo
Jeong Yun Ya
Don Winning
Boo-Deuk Kim
Hong Lee
Do-Young Kim
Young-Hoon Kim
Myung-sun Kim
Young-Ho Kim
Sang-mun Chon
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Influence of resin properties to resist performance at ArF lithography
2004
Sangwoong Yoon
Myung-sun Kim
Hong Lee
Do-Young Kim
Young-Hoon Kim
Boo-Deuk Kim
Jae Hyun Kim
Kyung-Mee Kim
Shi Yong Lee
Young-Ho Kim
Sang-mun Chon
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Citations (1)
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