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Bartosz Bilski
Bartosz Bilski
Carl Zeiss AG
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Extreme ultraviolet lithography
Optics
Computer science
Numerical aperture
4
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14
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High-NA EUV imaging: from system introduction towards low-k1 extension
2021
Eelco van Setten
Jan van Schoot
Anton van Oosten
Claire van Lare
Friso Wittebrood
Gijsbert Rispens
Gerardo Bottiglieri
John McNamara
Natalia Davydova
Jo Finders
Joerg Zimmermann
Bartosz Bilski
Paul Graeupner
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High NA EUV scanner: obscuration and wave front description
2020
Laurens de Winter
Jan van Schoot
Timur Tudorovskiy
Kars Zeger Troost
Erwin Stinstra
Stephen Hsu
Toralf Gruner
Juergen Mueller
Ruediger Mack
Bartosz Bilski
Joerg Zimmermann
Paul Graeupner
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High NA EUV lithography: Next step in EUV imaging
2019
Eelco van Setten
Gerardo Bottiglieri
John McNamara
Jan van Schoot
Kars Zeger Troost
Joseph Zekry
Timon Fliervoet
Stephen Hsu
Joerg Zimmermann
Matthias Roesch
Bartosz Bilski
Paul Graeupner
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Citations (12)
High-NA EUV imaging: challenges and outlook
2019
Bartosz Bilski
Joerg Zimmermann
Matthias Roesch
Jack Liddle
Eelco van Setten
Gerardo Bottiglieri
Jan van Schoot
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Citations (2)
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