Old Web
English
Sign In
Acemap
>
authorDetail
>
J. Frenck
J. Frenck
Crystalline silicon
Isotropic etching
Wafer
Materials science
Plasma processing
2
Papers
4
Citations
0.00
KQI
Citation Trend
Filter By
Interval:
1900~2024
1900
2024
Author
Papers (2)
Sort By
Default
Most Recent
Most Early
Most Citation
No data
Journal
Conference
Others
Plasma Enhanced Chemical Etching at Atmospheric Pressure for Crystalline Silicon Wafer Processing and Process Control by In-Line FTIR Gas Spetroscopy
2008
J. Frenck
M. Kirschmann
Volkmar Hopfe
Elena Sánchez López
Stefan Kaskel
Ines Dani
Wulf Grählert
Gerrit Mäder
Matthias Leistner
Dorit Linaschke
Show All
Source
Cite
Save
Citations (4)
Plasma Enhanced CVD and Plasma Chemical Etching at Atmospheric Pressure for Continuous Processing of Crystalline Silicon Solar Wafers
2008
Elena López
B. Dresler
G. Maeder
Ines Dani
Volkmar Hopfe
Stefan Kaskel
Moritz Heintze
R. Moeller
Harald Dr. Wanka
M. Kirschmann
J. Frenck
A. Poruba
R. Barinka
R. Dahl
H. Nussbaumer
Show All
Source
Cite
Save
Citations (0)
1