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Gerd Mainka
Gerd Mainka
Infineon Technologies
Iridium
Chemical-mechanical planarization
Polishing
Abrasive
Materials science
5
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4
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Chemical Mechanical Polishing of Iridium and Iridium Oxide for Damascene Processes
2001
Journal of The Electrochemical Society
Gerd Mainka
Gerhard Beitel
Rainer Florian Schnabel
Annette Saenger
Christine Dehm
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Stack capacitor integration with buried oxygen barrier using chemical mechanical polishing of noble metals
2001
VLSI-TSA | International Symposium on VLSI Technology, Systems, and Applications
Rainer Florian Schnabel
Gerhard Beitel
Peter Bosk
Christine Dehm
Andreas Hauser
Igor Kasko
Gerd Mainka
Thomas Mikolajick
H.D. Mullegger
Nicolas Nagel
Michael Dr. Röhner
S. Poppa
C Sama
Ulrich Scheler
Volker Weinrich
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A method for chemical mechanical polishing of layers of metals of the platinum group
2000
Annette Saenger
Gerhard Beitel
Gerd Mainka
Florian Schnabel
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Patterning of noble metal electrodes and oxygen barriers by CMP
2000
Integrated Ferroelectrics
Rainer Florian Schnabel
Gerhard Beitel
Gerd Mainka
A. Sänger
Peter Bosk
Z. Chen
R. Small
Christine Dehm
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Production of reconstituted solutions
1998
Manfred Eschwey
Gerd Mainka
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