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N. Limburn
N. Limburn
Thin film
Stress (mechanics)
Sputter deposition
Physical vapor deposition
Wafer
1
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3
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NiV Stress Control Utilizing PVD with an Ar / N2 Gas Mixture
2012
G. Seryogin
S. Golovato
S Smith
K. Williams
N. Limburn
A. Winn
G. Mundada
G. Adema
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Citations (3)
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