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Yoshio Kawanobe

Canon Inc.

5

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12

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In-line surface preparation and resist plug removal on NIL templates

2016
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Defectivity and particle reduction for mask life extension, and imprint mask replication for high-volume semiconductor manufacturing

2016 Proceedings of SPIE
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Novel approaches to meet the requirements for double patterning

2009 Proceedings of SPIE
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Performance of the FPA-7000AS7 1.35 NA immersion exposure system for 45-nm mass production

2008 Proceedings of SPIE
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New generation i-line lens for 0.35-um lithography

1995
- Hiroyuki Ishii
- Yoshio Kawanobe
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Citations (1)