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S. Taeger
S. Taeger
Osram Opto Semiconductors GmbH
Oxide
Analytical chemistry
Deposition (law)
Optics
Engineering physics
2
Papers
6
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0
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2024
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A comparative study on atomic layer deposited oxide film morphology and their electrical breakdown
2020
Surface & Coatings Technology
I. Reklaitis
E. Radiunas
Tadas Malinauskas
S. Stanionyte
G. Juska
R. Ritasalo
T. Pilvi
S. Taeger
Martin Strassburg
R. Tomasiunas
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Citations (6)
ALD oxides for GaN interfaces: a comparative view on the flat band
2019
ICTON | International Conference on Transparent Optical Networks
R. Tomasiunas
I. Reklaitis
E. Radiunas
G. Juska
R. Ritasalo
T. Pilvi
M. Mandl
S. Taeger
Martin Strassburg
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