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B. Mohamad
B. Mohamad
Los Angeles Harbor College
Electronic engineering
Equivalent oxide thickness
Oxide
Dipole
Gate oxide
7
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12
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Determination of well flat band condition in thin film FDSOI transistors using C-V measurement for accurate parameter extraction
2018
Solid-state Electronics
B. Mohamad
C. Leroux
G. Reimbold
G. Ghibaudo
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Reliable gate stack and substrate parameter extraction based on C-V measurements for 14 nm node FDSOI technology
2017
Solid-state Electronics
B. Mohamad
C. Leroux
D. Rideau
M. Haond
G. Reimbold
G. Ghibaudo
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Effect of La and Al addition used for threshold voltage shift on the BTI reliability of HfON-based FDSOI MOSFETs
2017
IRPS | International Reliability Physics Symposium
Pushpendra Kumar
C. Leroux
B. Mohamad
A. Toffoli
G. Romano
Xavier Garros
Gilles Reimbold
Florian Domengie
Carlos Suarez Segovia
G. Ghibaudo
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(Invited) Dipoles in Gate-Stack/FDSOI Structure
2017
G. Reimbold
C. Leroux
Carlos Suarez Segovia
B. Mohamad
Pushpendra Kumar
Xavier Garros
Florian Domengie
P. Blaise
G. Ghibaudo
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WITHDRAWN: Determination of well flat band condition in thin film FDSOI transistors using C-V measurement for accurate parameter extraction
2017
Microelectronic Engineering
B. Mohamad
C. Leroux
G. Reimbold
G. Ghibaudo
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